Whether you are looking for Photoresist Processing Tools for high volume manufacturing, or manually loaded systems like our FotoFab for your research facility, S-Cubed tools can be configured for your needs. Our advanced meta-form engineering insures that proven assemblies and process modules can be stacked to create exactly the system and the process you want.
Just some of the applications our equipment is used in include:
- Photoresist Coat and develop.
- Wafer Edge Exposure (WEE)
- Thick photoresist films processing for copper pillar and gold bump processes
- Photoresist Processing of Lithium Niobate and other pyroelectric Substrates
- Lift Off Resist (LOR) processing
- Negative tone Lift Off resist processing
- Metal Lift Off Cleaning
- Photoresist Stripping and Rework Cleaning
- Wafer Level Solder flux deposit, reflow and flux clean
- Polyimide Coat and develop, negative tone
- Coating of photo active and non photo active protective films in WLCSP
- TMAH puddle develop negative and positive tone
- CAR resist processing, PEB technology
- WEE processing of negative tone resists for protective seal rings