High Volume Production Photoresist processing for up to 300mm wafers. Completely programmable with lowest COO in the industry.
A low footprint production photoresist with radial robot access and stacked modules for up to 200mm wafers.
For production photoresist processing of wafers to 200mm, with high speed handling and programmable wafer centering.
Our Wafer Edge Processing provides concentricity within .75mm, handling wafer sizes to 300mm, with flat following & patterns.
For your lab or research facility these value oriented machines replicate high cost lithography processesin smaller, less expensive footprints.
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