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Lowering Cost of Ownership (COO): “Track” Tools in Back end of the Line (BEOL) Thick Resist Film processes

Since the adoption of new process nodes has been significantly slowed down due to availability and cost of next generation FEOL lithography technologies, it is ever more important that the continuation of cost reductions and… Continue reading Lowering Cost of Ownership (COO): “Track” Tools in Back end of the Line (BEOL) Thick Resist Film processes

System Granularity and Management of Change and Growth

A very important aspect of cost of ownership (COO) of tools that include spin coaters and developers (often referred to a photoresist track tools) in the back end of line (BEOL), MEMS, and patterned sapphire… Continue reading System Granularity and Management of Change and Growth

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