Wafer Edge Exposure
WEE (Wafer Edge Exposure)
- Up to 15000 milliwatts per square centimeter exposure energy
- Programmable exposure dose
- Closed loop control of exposure dose
- Exposure dose traceable to NIST
- No need to handle, buy or swap masks. Pattern and wafer size is programmable
- Flat following exposure pattern
- Notched programmable exposure pattern available
- SECS/GEM Factory Automation Available
- System operates by “painting” the edge of the wafer with light
- Handles differing wafer sizes interchangeably and programmatically
Applications
S-Cubed provides higher reliability, more functionality and a smaller footprint – all at a lower cost. We do this by eliminating “non value added” hardware and by the use of advanced controls, software and robotics.
