Semiconductor Photoresist, And Cleaning Process Tools

TMAH puddle develop negative and positive tone

As the aqueous develop is essentially an etch, it is important that corrosion rather than erosion be the only process so that develop “hot spots” can be avoided. Hot spots will very adversely effect develop uniformity. A “zero impact” dispense means that can very rapidly build a puddle without creating hot spots must be used. To further improve uniformity, develop rate and reduce developer consumption the tool should provide user programmable agitation. Agitation during the puddle develop of aqueous based develop process provide refreshment of reactant at the photoresist/developer boundary layer which provides the benefits of uniformity, consumption and rate.