Semiconductor Photoresist, And Cleaning Process Tools

S-cubed offers customized systems with off-the-shelf prices

  • Scene 12

    Scene 12

    Capable of processes including: Prime, Chill, Coat, Bake, PEB, WEE, Develop – with up to 50 wafers on the tool this work horse can do it all.

  • Scene 8

    Scene 8

    For production photoresist processing of wafers to 200mm, with high speed handling and programmable wafer centering.

  • Flexi

    Photoresist Processing Systems

    A low footprint production photoresist with radial robot access and stacked modules for up to 200mm wafers.

  • WEE


    Our Wafer Edge Processing provides concentricity within .75mm, handling wafer sizes to 300mm, with flat following & patterns.

  • PRC 6625

    Back Side Reticle Cleaner

    For cleaning the backside of a pellicilized reticle without affecting or even touching the pellicilized side.

  • S Cubed – Basic

    S Cubed – Basic

    For your lab or research facility these value oriented machines replicate high cost lithography processesin smaller, less expensive footprints.