S-cubed offers customized systems with off-the-shelf prices
Capable of processes including: Prime, Chill, Coat, Bake, PEB, WEE, Develop – with up to 50 wafers on the tool this work horse can do it all.
For production photoresist processing of wafers to 200mm, with high speed handling and programmable wafer centering.
A low footprint production photoresist with radial robot access and stacked modules for up to 200mm wafers.
Our Wafer Edge Processing provides concentricity within .75mm, handling wafer sizes to 300mm, with flat following & patterns.
For cleaning the backside of a pellicilized reticle without affecting or even touching the pellicilized side.
S Cubed – Basic
For your lab or research facility these value oriented machines replicate high cost lithography processesin smaller, less expensive footprints.