Semiconductor Photoresist, And Cleaning Process Tools
Lowest cost
of ownership
Advanced Robotics for Process Flexibility, Stable and Proven Operation. READ MORE
Extreme reliability & Performance achieved using advanced
meta-form engineering. Read More
Applications
Photoresist Coat and Develop
S-Cubed Scene 12 Photoresist Processor, coater developer
Polyimide Coat and Develop, Negative Tone
FLEXI-Photoresist-Spin-Coater
Coating of Photo Active and Non Photo Active Protective Films in WLCSP
FLEXI-Photoresist-Spin-Coater
TMAH Puddle Develop Negative and Positive Tone
S-Cubed Scene 12 Photoresist Processor, coater developer
Photoresist Processing Of Lithium Niobate And Other Pyroelectric Substrates
FLEXI-Photoresist-Spin-Coater
Thick Photoresist Films Processing For Copper Pillar And Gold Bump Processes
S-Cubed Scene 12 Photoresist Processor, coater developer
Solder Flux Deposit, Reflow And Flux Clean
FLEXI-Photoresist-Spin-Coater
Wafer Edge Exposure
S-Cubed Scene 12 Photoresist Processor, coater developer
Photoresist Stripping and Rework Cleaning
FLEXI-Photoresist-Spin-Coater
Metal Lift Off Cleaning
FLEXI-Photoresist-Spin-Coater
Negative Tone Lift Off Resist Processing
S-Cubed Scene 12 Photoresist Processor, coater developer
Lift Off Resist (LOR) Processing
FLEXI-Photoresist-Spin-Coater
WEE Combined with Develop
S-Cubed Scene 12 Photoresist Processor, coater developer
WEE Processing Of Negative Tone Resists For Protective Seal Rings
S-Cubed Scene 12 Photoresist Processor, coater developer
The Scene 12 Photoresist processor for up to 300mm wafer bake, coat, & develop.
S-Cubed Scene 12 Photoresist Processor, coater developer

Our resist processing systems like the Scene 12 employ advanced Meta-Form design pushing the cost-performance curve…READ MORE
  • Photolithography Coaters & Developers for broad processes & applications

    The next act in the advancement of resist processing systems, the Scene12TM for up to 300mm wafers (and the Scene8TM for up to 200mm wafers) provides more capability in less space at lower cost than any system from any manufacturer world wide. READ MORE

  • Global Presence, Local Support

    S-Cubed semiconductor lithography equipment fulfills demanding process operations at semiconductor production centers around the world. Our global team provides local support in APAC, EMEA and throughout North America. READ MORE

Recent Discussions From The Blog
Products
The Scene 8

The next act in the advancement of resist processing systems, the Scene 8tm (pictured left) for up to 200mm wafers (and the Scene12tm for up to 300mm wafers) provides more capability in less space at lower cost than any system from any manufacturer world wide.

Read More
Why new s-cubed systems have a lower cost of ownership than used

As it becomes apparent that the adoption of new process nodes has been significantly slowed down due to availability and cost of next generation FEOL lithography technologies, it becomes ever more important that the continuation of cost reductions and functionality improvements that have driven the growth of the Semiconductor industry over the last 40 years be sought elsewhere.

About us

The S-Cubed Engineering Team is comprised of accomplished engineers and entrepreneurs with a long history of designing and manufacturing innovative equipment for the semiconductor and allied industries. The Group holds many patents and has been involved in the design, manufacture and marketing of many semiconductor industry “firsts” including: Read More